Resilith-N – High Resolution Negative Photoresist

Our new line of UV and DUV negative photoresists is designed to empower innovators and manufacturers alike by democratizing access to one of the most fundamental chemicals in semiconductor fabrication. 

 

Resilith-N is engineered to provide a negative-tone photoresist that withstands a broad range of processing conditions, including harsh HF-based etching and liftoff processes, ensuring robust performance even in the most demanding production environments.

 

Key Features:

• Exceptional Process Resistance:
  Resilith-N’s formulation delivers outstanding resistance to common semiconductor processing challenges, making it an ideal choice for both UV and deep-UV (DUV) lithography. Its durability extends through aggressive etching and liftoff steps, maintaining pattern fidelity and integrity throughout your manufacturing process.

• Universal Compatibility:
  Designed for seamless integration with existing semiconductor fabrication infrastructures, Resilith-N supports both traditional UV and advanced DUV processes. This versatility makes it a key enabler for a wide range of applications—from high-performance integrated circuits to advanced micro- and nanofabrication.

• Empowering Innovation:
  At Engistaff Semiconductor, we believe that access to top-quality semiconductor materials should not be limited to a select few. Resilith-N is our commitment to democratizing the semiconductor fabrication process, providing affordable, high-performance photoresists that level the playing field and empower innovators across the globe.

• Fundamental to Semiconductor Success:
  Resilith-N is more than just a negative photoresist—it’s a cornerstone chemical that underpins the entire semiconductor manufacturing ecosystem. Its robust performance and reliability ensure that every critical pattern and structure is realized with the precision required for today’s advanced electronics.

 

Our Vision with Resilith-N:
We envision a world where high-quality semiconductor fabrication is accessible to everyone — from cutting-edge research labs to small-scale manufacturers. With Resilith, we’re making that vision a reality by offering a photoresist that combines durability, versatility, and ease of use, all while withstanding the rigors of modern semiconductor processing.

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Discover Resilith-N:
Experience the future of photolithography with Resilith-N — where robust performance meets universal accessibility, driving innovation across the semiconductor industry.