Saving You Time and Resources

Our mission is to simplify and by extension reduce the overhead for your semiconductor processing efforts. We achieve this through our product lines of Doplyth and Oxilith.

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In semiconductor manufacturing, efficiency is paramount. Our Doplyth and Oxilith solutions are engineered to reduce process complexity, minimize waste, and lower production costs. Discover how our innovative photolithographic technology delivers tangible benefits to your business.

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Featured Products:

• Doplyth: Our photolithographic spin-on-dopants, available for both n-type and p-type applications in UV (365 nm) and DUV (248 nm) versions.

• Oxilith: Our photolithographic spin-on dielectrics that form high-quality, patterned SiO₂ layers without the need for HF etching.

 

Process Streamlining:

• One-Step Integration:
  Combine dopant or dielectric deposition and patterning in a single, streamlined step, eliminating additional masking, etching, and cleaning processes.

• Faster Cycle Times:
  Rapid UV or DUV curing drastically reduces process time, increasing throughput and shortening time-to-market.

 

Resource Optimization:

• Reduced Chemical Consumption:
  Fewer processing steps lead to lower usage of chemicals and less hazardous waste, reducing both costs and environmental impact.

• Improved Yields:
  High-precision patterning and uniform film formation translate into consistent device performance and fewer production defects.

 

Business Impact:

• Accelerate production schedules

• Lower operational costs and improve profit margins

• Achieve scalability and flexibility in manufacturing processes